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Fabrication and improvement of nanopillar InGaN/GaN light-emitting diodes using nanosphere lithography

机译:使用纳米球光刻制造和改进纳米柱InGaN / GaN发光二极管

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摘要

Surface-patterning technologies have enabled the improvement of currently existinglight-emitting diodes (LEDs) and can be used to overcome the issue of low quantum efficiency ofgreen GaN-based LEDs. We have applied nanosphere lithography to fabricate nanopillars onInGaN∕GaN quantum-well LEDs. By etching through the active region, it is possible to improveboth the light extraction efficiency and, in addition, the internal quantum efficiency through theeffects of lattice strain relaxation. Nanopillars of different sizes are fabricated and analyzed usingRaman spectroscopy. We have shown that nanopillar LEDs can be significantly improved byapplying a combination of ion-damage curing techniques, including thermal and acidic treatment,and have analyzed their effects using x-ray photoelectron spectroscopy.
机译:表面图案化技术已使现有的发光二极管(LED)得以改进,可用于克服绿色GaN基LED的低量子效率问题。我们已应用纳米球光刻技术在InGaN ∕ GaN量子阱LED上制造纳米柱。通过蚀刻穿过有源区,可以通过晶格应变弛豫的效果提高光提取效率,并且此外还可以提高内部量子效率。使用拉曼光谱法制造和分析不同大小的纳米柱。我们已经表明,通过应用离子损伤固化技术(包括热处理和酸性处理)的组合,可以显着改善纳米柱状LED,并且已经使用X射线光电子能谱分析了它们的效果。

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